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1

Semi-Automatic Wax Mounting Machine for Silicon and Compound Semiconductor Wafers

HY-SW360 is used for mounting compound semiconductor wafers on ceramic plates prior to thinning. It features precise quantitative solid wax dispensing, independent air cylinder pressing and accurate temperature control, achieving TTV ≤0.005 mm after mounting. Composed of mechanical, pneumatic-water and electrical control subsystems, it delivers stable high-precision wax mounting for wafer thinning processes.

  • Brand :

    HYRNUS
  • Item No. :

    HY-SW360
  • Order(MOQ) :

    1 Set
  • Warranty :

    One-Year Warranty and Lifetime Maintenance
  • Payment :

    T/T
  • Lead Time :

    7-35 Days
  • Product Origin :

    China
  • Semi-Automatic Wax Mounting Machine for IC Bonding and Silicon Compound Semiconductor Wafers

     

    Product Introduction

    HY-SW360 Semi-Automatic Wax Mounting Machine performs wafer bonding onto ceramic carriers as the pre-process for single-side wafer thinning.

    It adopts solid wax melting design with ±0.02g accurate fixed-quantity wax dispensing, paired with independent air cylinder compression and dual heating-cooling platforms featuring closed-loop precise temperature regulation. The finished mounting flatness reaches TTV ≤ 5 μm. Designed for 4-inch and 6-inch wafers, the unit adopts PLC centralized control and consists of integrated mechanical, pneumatic-water and electrical control subsystems, supporting stable long-term operation and consistent high-precision wax mounting for wafer back grinding.

     

    Product Advantages

    1. Adopts solid wax melting method for accurate and quantitative wax dispensing.

    2. The heating and cooling chuck is equipped with a precision heating and automatic cooling system to accurately control the chuck surface temperature.

    3. Adopts independent cylinder pressing with precise air pressure control, enabling accurate control of wax layer thickness.

    4. TTV after mounting ≤ 0.005 mm.

     

    Application Fields

    This equipment is mainly used for mounting wafers such as GaN, GaAs, sapphire and SiC onto the surface of ceramic carriers before single-side thinning.

     

    Key Systems of the Equipment

    System Category Component Specification / Brand
    Mechanical Structure Sheet Metal National Standard 60×60×5 Square Tube + Industrial Grade Baking Paint Outer Frame
    Parts 45# Steel with Surface Hard Chrome Treatment / Stainless Steel 304 / AL6061 with Surface Anodizing Treatment
    Pneumatic Pressure Holding Mechanism In-house Manufactured
    Heating Stage Mechanism In-house Manufactured
    Transfer Mechanism In-house Manufactured
    Linear Guide THK / HIWIN / TBI
    Electrical Control System PLC Panasonic / Mitsubishi / Delta
    Touch Screen Weinview / Weintek / Advantech
    Power Protection Leakage Circuit Breaker (Mingwei / Schneider)
    DC Power Supply Switching Power Supply (Mingwei / Schneider)
    Pneumatic System Air Cylinder SMC / CKD / FESTO
    Pressure Control SMC / CKD / FESTO
    Pressure Regulation SMC / CKD / FESTO
    Pressure Indication SMC / CKD / FESTO
    Solenoid Valve SMC / CKD / FESTO

     

    Technical Parameter

    Parameter Name Specification
    Model HY-SW360
    Applicable Wafer Size 4-inch / 6-inch
    Suction Robot Stroke 450 mm
    Suction Robot Axis Quantity Single Axis (3-axis design reserved)
    Suction Robot Repositioning Accuracy ±0.05 mm
    Suction Robot Vacuum Pressure Range -70 ~ -90 kPa
    Ceramic Carrier Dimension Φ360 × 15 mm
    Solid Wax Service Life 350 wafers per wax stick
    Wax Dispenser Temperature Control Range 40 ~ 130
    Operating Temperature of Wax Dispenser 100
    Wax Dispensing Accuracy ±0.02 g
    Wax Dispenser Repositioning Accuracy ±0.05 mm
    Heating Plate Heating-up Time 3 min
    Heating Plate Cooling Time 3 min
    Heating Plate Temperature Control Range 60 ~ 130
    Heating Plate Temperature Control Precision ±0.5
    Press Cylinder Load 100 ~ 1000 Kg @ 0.6 MPa ±1% F.S.
    Wax Layer Uniformity TTV ≤ 5 μm
    General Air Supply 0.4–0.7 MPa (Dry & Oil-free)
    Main Control System PLC
    Total Power Consumption Approx. 7 kW
    Total Machine Weight Approx. 1000 kg
    Overall Dimension (L×W×H, mm) 1550×1550×1900 (Excluding tri-color indicator light height)
     

    Site Facility Requirements

    Category Item Specification
    Site Facilities (Auxiliary Equipment) Power Supply Machine Voltage: AC220V±10%, Current: 20A, Power: 1.2 KW
    Environmental Requirements Workshop Temperature: 15°C-25°C, Relative Humidity: ≤80%
    Air Supply 0.4~0.6 MPa, Flow Rate >20 L/min, Pipe Diameter: Φ12 mm
    Cooling Water Supply Inlet Water Temperature: 3~22°C, Circulating Water Flow: 15~30L/min, Circulating Water Supply Pressure: 0.2MPa

    Product Details

     

    Wafer Mounting Machine

     

     

     

     

     

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Contact us:allen@hyrnus.com