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12-inch Single Spindle Semi-automatic Wafer Dicing Saw with Broken Blade Online Detection

HY-WD1201 accommodates max Φ300mm workpieces with 310mm X/Y travel for 8–12 inch frames. Equipped with rigid anti-vibration structure, 0.003mm Y-axis positioning accuracy and 380° θ-axis rotation, it carries a 10000–60000rpm spindle compatible with Φ58mm blades. Standard with blade inspection, auto sharpening, 15-inch touch control and GEM communication, this 115010201750mm/1000KG machine realizes precision cutting for silicon wafers, SiC, ceramics, optical glass and magnetic materials.

  • Brand :

    HYRNUS
  • Item No. :

    HY-WD1201
  • Order(MOQ) :

    1 Set
  • Warranty :

    One-Year Warranty and Lifetime Maintenance
  • Payment :

    T/T
  • Lead Time :

    7-35 Days
  • Product Origin :

    China
  • 12-inch Single Spindle Semi-automatic Wafer Dicing Saw with Broken Blade Online Detection

     

    Product Introduction

    HY-WD1201 12-inch Single Spindle Semi-automatic Wafer Dicing Saw supports max workpiece size of Φ300mm and fits 8–12 inch frame workpieces, with 310mm X/Y cutting travel. It adopts a high-rigidity frame, vibration-damping Z-axis and high-speed X-axis structure. The X-axis feed speed is 0.1–1000mm/s, Y-axis full-stroke positioning accuracy ≤0.003mm, and θ-axis rotation reaches 380°. Equipped with a 10000–60000rpm high-speed spindle for blades up to Φ58mm.

    Standard configuration includes online blade breakage detection, non-contact blade sensing and automatic sharpening. It adopts a 15-inch touch control system and supports GEM communication protocol. Powered by single-phase AC220V, the machine measures 1150*1020*1750mm and weighs approximately 1000KG. Suitable for precision dicing of 8–12 inch silicon wafers, silicon carbide, ceramics, optical glass and magnetic materials.

     

    Excellent structural design

    1. High rigidity body ensures stable operation of the machine.

    2. Specially designed Z-axis mechanism eliminates position offset caused by spindle vibration.

    3. Special high rigidity design of the X-axis significantly improves rapid traverse speed, enhancing production efficiency.

    4. Equipped with online blade grinding device to meet the blade sharpening needs during cutting of high-strength materials.

    5. Fully servo-controlled handling mechanism ensures smooth handling, eliminating the possibility of shovel damage during handling.

    6. Centralized lubrication system for easier maintenance, ensuring long-term precision of the machine.

    Product Application

    The equipment is applicable to 8–12 inch silicon wafers, silicon carbide wafers, optical communication devices, ceramics and glass substrates, and magnetic materials.

    Reliable and convenient operating system

    1. 15-inch touch screen display shows more machine status information, with simple and smooth operation.

    2. All fluids are controlled by software and stored in program groups, saving time for product changeover adjustments.

    3. Self-developing motion control and image analysis algorithm improve system reliability and stability.

    4. Semiconductor standard protocol facilitates integration with factory automation systems.

    Technical Specifications

     
    Category Item Parameter
    Model Info Model HY-PD1201
    Basic Workpiece Maximum Size of Workpiece Φ300 mm
    X Axis Dicing Range 310 mm
    Feed Speed Input Range 0.1–1000 mm/s
    Y Axis Dicing Range 310 mm
    Single Step Increment 0.0001 mm
    Y Axis Positional Accuracy Within 0.003 mm / 310 mm
    Z Axis Maximum Valid Stroke 14.7 mm (with Φ2" blade)
    Movement Resolution 0.00005 mm
    Repeat Accuracy 0.001 mm
    Maximum Usable Blade Diameter Φ58 mm
    θ Axis Maximum Rotation Angle 380°
    Spindle Operating Speed Range 10000–60000 rpm
    Maximum Power (kW)
    1.8 / 2.4 (at 60000 rpm)
    Torque (N·M) 0.3 / 0.4 (15000–60000 rpm)
    Functional Features Broken Blade Online Detection Yes
    Non-Contact Automatic Blade Presetting Yes
    Automatic Sharpening Yes
    GEM Communication Protocol Yes
    Wafer Frame Maximum Usable Frame Size 8–12 inches
    Other Specifications Power Supply Single-phase AC220V
    Equipment Dimension (LWH) 1150*1020*1750 mm
    Equipment Weight ≈1000 KG

     

    Terms of Use

    1. Clean compressed air with atmospheric dew point between -10℃ to -20℃, residual oil content of 0.1 ppm, and filtration rating of 0.01 μm/99.5% or higher.

    2. Maintain the room temperature where the machinery is placed between 20℃ to 25℃ and control the fluctuation within ±1℃.

    3. Control the temperature of the cutting water to be at room temperature +2℃, with fluctuations within ±1℃.

    4. Control the temperature of the cooling water to be the same as room temperature, with fluctuations within ±1℃.

    Product Details

      •  

    Silicon wafer slicing machine

       

       

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    If you are interested in our products and want to know more details,please leave a message here,we will reply you as soon as we can.
    Contact us:allen@hyrnus.com